Two-photon lithography (TPL) is a widely used 3D nanoprinting technique that uses laser light to create objects. Challenges to large-scale adoption of this additive manufacturing method include identifying light dosage parameters and monitoring during fabrication. A research team from Lawrence Livermore National Laboratory, Iowa State University, and Georgia Tech is applying machine learning models to tackle these challenges—i.e., accelerate the process of identifying optimal light dosage parameters and automate the detection of part quality. Funded by LLNL’s Laboratory Directed Research and Development Program, the project team has curated a video dataset of TPL processes for parameters such as light dosages, photo-curable resins, and structures. Both raw and labeled versions of the datasets are available on the links in the Open Data Initiative page.
The data exploration code included uses the labeled dataset.
Download labeled dataset from Open Data Initiative page. Then upload data and jupyter notebook to your Google Drive account. Run notebook on Google Colab.
X.Y. Lee, S.K. Saha, S. Sarkar, B. Giera. "Automated detection of part quality during two-photon lithography via deep learning." Additive Manufacturing 36, December 2020: doi.org/10.1016/j.addma.2020.101444
X.Y. Lee, S.K. Saha, S. Sarkar, B. Giera. "wo Photon lithography additive manufacturing: Video dataset of parameter sweep of light dosages, photo-curable resins, and structures." Data in Brief 32, October 2020. doi.org/10.1016/j.dib.2020.106119.
This notebook is distributed under the terms of the MIT license. See LICENSE and NOTICE for details.
SPDX-License-Identifier: MIT
LLNL-CODE-839828